《真空》是一份國際性的快速出版期刊，專注于短時(shí)間的交流。所有的論文都是同行評(píng)審的，評(píng)審過程是面向快速周轉(zhuǎn)時(shí)間的簡(jiǎn)短溝通。該雜志還發(fā)表了完整的研究論文、專題論文和一些重要會(huì)議的精選論文。一份真空?qǐng)?bào)告應(yīng)代表一個(gè)領(lǐng)域的重大進(jìn)展，該領(lǐng)域涉及一個(gè)大氣壓或以下的受控環(huán)境。期刊的范圍包括:1. 真空;在真空抽真空和儀器儀表、真空測(cè)量、真空氣體動(dòng)力學(xué)、氣體表面相互作用、特高壓應(yīng)用的表面處理和低放氣、真空熔煉、燒結(jié)和真空計(jì)量方面的最初發(fā)展。大型設(shè)施(如粒子加速器和聚變裝置)的技術(shù)和解決方案。新儀器(如探測(cè)器和電子顯微鏡)。2. 等離子體科學(xué);PVD、CVD、等離子輔助CVD、離子源、沉積過程及分析等方面的研究進(jìn)展。3.表面科學(xué);表面工程，表面化學(xué)，表面分析，晶體生長，離子-表面相互作用和蝕刻，納米尺度處理，表面改性。4. 材料科學(xué);新穎的功能或結(jié)構(gòu)材料。金屬、陶瓷和聚合物。用于理解結(jié)構(gòu)-屬性關(guān)系的實(shí)驗(yàn)、模擬和建模。薄膜和涂料。納米結(jié)構(gòu)和離子注入。簡(jiǎn)短交流的目的是讓研究人員能夠快速地與同事分享他們最令人興奮的工作。從提交到最終決定的預(yù)期時(shí)間約為6.4周。

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.The scope of the journal includes:1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.The aim of the short communications is to enable researchers to rapidly share their most exciting work with their colleagues. The expected time from submission to final decision is approximately 6.4 weeks.